Sale!

NEOVA 15-Minute Reset Mask (50 ml / 1.7 fl oz)

Original price was: $85.00.Current price is: $25.50.

SKU: 'a4064 Category:

Description

NEOVA 15-Minute Reset Mask is an intensive exfoliating mask that dissolves dead skin cells, deep cleanses the pores, and reduces signs of oxidative damage.*

Key Ingredients

  • Retinol
  • Alpha Hydroxy (Citric) Acid
  • Beta Hydroxy (Salicylic) Acid
  • Tocopheryl Acetate (Vitamin E)
  • Vaccinium Myrtillus (Bilberry) Fruit Extract
  • Oryza Sativa

Key Benefits

  • helps exfoliate, moisturize, and nourish the skin
  • helps promote continuous cell turnover to remove dead, dulling skin cells and push up new, undamaged cells from below
  • helps rapidly resurface the skin and sweep away dullness
  • helps deep cleanse and unclog the pores
  • helps maintain skin elasticity and suppleness by optimizing skin’s vital oil-moisture balance
  • helps brighten the skin and enhance radiance
  • helps protect the skin against oxidative stress

NEOVA 15-Minute Reset Mask is suitable for all skin types.

Instructions

Once a week in the p.m., apply a thin layer to clean skin. Leave in place for 15 minutes, then rinse well with cool water. For maximum results, follow with serum and moisturizer. Protect new skin cells with a broad spectrum sunscreen during daylight hours.

Ingredients

Water (Aqua), Kaolin, Propylene Glycol, Citric Acid, Sodium Citrate, Lactose, Vaccinium Myrtillus Fruit Extract, Microcrystalline Cellulose, Oryza Sativa Starch, Salicylic Acid, Tocopheryl Acetate, Retinol, Saccharum Officinarum (Sugar Cane) Extract, Citrus Aurantium Dulcis (Orange) Fruit Extract, Citrus Limon (Lemon) Fruit Extract, Acer Saccharum (Sugar Maple) Extract, CI 77891 (Titanium Dioxide), CI 77491 (Iron Oxides Red), Ethylhexylglycerin, Caprylic/Capric Triglyceride, Hydroxypropyl Methylcellulose, Xanthan Gum, Phenoxyethanol.

* Individual Results May Vary

Reviews

There are no reviews yet.

Be the first to review “NEOVA 15-Minute Reset Mask (50 ml / 1.7 fl oz)”

Your email address will not be published. Required fields are marked *